The Adventa APC framework provides run-to-run process control
for semiconductor manufacturing equipment. Adventa software uses control
strategies containing process models to relate wafer characteristics to
machine conditions and settings. This run-to-run process control approach uses
information about the current state of the material (feedforward data),
machine, and the desired results (targets) to select the appropriate control
strategy and process model. Then, it determines the values for manipulated
variables (typically, machine settings) and executes the next lot based on
those new settings.
Leading
semiconductor equipment manufacturers worldwide choose Adventa to address and
exceed the complex requirements of fabwide APC deployments. We have helped
customers implement complete fabwide deployment of APC on virtually all types
of semiconductor process equipment including etch, deposition, cleaning,
lithography systems (track and steppers), CMP, RTP, and multi-chambered
cluster tools.
Our resources
are used by fabs worldwide to:
-
perform requirements analyses
and deployment plans for APC applications
-
train and mentor equipment
engineering staffs on the use of APC
-
assist with deployment of APC
software
-
create APC models for specific
tool types
For more information about Advanced Process Control,
read these related articles.
To learn about the features and benefits of our products for advanced process control,
select a product below:
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