The following articles appeared in various volumes of IEEE Transactions on Semiconductor Manufacturing:

• Supervisory Run-to-Run Control of Poly Silicon Gate Etch Using In Situ Ellipsometry

• Spatial Characterization of Wafer State Using Principal Component Analysis of Optical Emission Spectra in Plasma Etch

• Run by Run Advanced Process Control of Metal Sputter Deposition

• Integration of In Situ Spectral Ellipsometry with MMST Machine Control